Fab Metrology Turns A Research Tool Industrial
Atomic-layer deposition films and gate dielectric interfaces sit within the ten nanometre sampling depth, which makes surface chemistry a process control parameter rather than a research curiosity. Growth at 10.5% follows fab adoption directly. What a fab wants is throughput, automation, wafer handling and uptime measured in months, none of which a research instrument was designed to deliver. Suppliers who built a separate product line for this are winning it, and those adapting research systems mostly are not. Fab qualification cycles run for years and close the position to whoever arrives late.
Market Impact: Generates 41% from service revenue








