Gate-All-Around Tools Displace Legacy Planar Deposition
Foundries across major East Asian and North American fabs are increasingly specifying gate-all-around-compatible ALD tools positioned against legacy planar deposition tool designs, responding to demand for atomic-scale uniformity that speeds leading-edge node qualification without maintaining separate planar-only process flows at scale. This shift has required toolmakers to invest in precursor chemistry engineering and uniformity testing capability, a process that can take twelve to twenty-four months per tool generation given required qualification depth. Foundries are increasingly treating gate-all-around compatibility as a competitive prerequisite for new leading-edge fab contract awards, accelerating the transition considerably across the industry.
Market Impact: Adds 9 percent node-driven volume








