EUV Lithography Steadily Displaces Deep Ultraviolet Tools
Foundries across major East Asian and North American markets are increasingly specifying extreme ultraviolet lithography systems positioned against legacy deep ultraviolet tools, responding to demand for sub-seven-nanometer resolution that immersion lithography physically cannot achieve at commercially viable throughput. This shift has required vendors to invest in precision optics engineering and light source reliability capability, a process that can take eighteen to twenty-four months per platform generation given required overlay validation. Foundries are increasingly treating EUV specification as a competitive prerequisite for new advanced node capacity, accelerating the transition well beyond deep ultraviolet retention.
Market Impact: Adds 9 percent volume from AI demand

