X-Ray Metrology Displaces Optical Systems at Extreme Layers
Small-angle X-ray scattering systems are moving from research curiosity to production-line necessity as NAND layer counts exceed three hundred, since X-rays penetrate depths optical scatterometry simply cannot reach without destructive cross-sectioning of the wafer itself. Samsung and SK Hynix both qualified X-ray metrology tools for high-volume manufacturing across 2025 as their most advanced fabrication lines moved into production ramp. This shift is forcing metrology suppliers without X-ray capability to either acquire it or risk losing process-of-record positions on the industry's most advanced nodes to competitors who invested earlier in this measurement technology.
Market Impact: Capex commitments rose 24 percent








